The PSD-UVT was designed for applications in the electronic, semiconductor and scientific industries. A mercury vapor lamp generates ultra-violet light and ozone resulting in the atomic cleaning of silicon, silicon nitride, glass and other materials. The PSD-UVT can also be used for UV curing, UV patterning, sharpening AFM probes and ozone etching. The addition of a heated stage on the PSD-UVT enhances the cleaning process of many applications. Unit specifications appear below.

• Digitally Controlled Heated Stage up to 150 degrees C
• The PSD-UVT removes organic contaminates
• UV lamp generates UV light at both 185nm and 254nm
• Produces O3 and provides molecular excitation
• Operates at atmospheric pressure with ambient air or oxygen
• Multiple gas ports for the introduction of gases
• Adjustable sample to lamp distance
• Safety switched to prevent user exposure to UV light
• Simple operation and compact footprint
• First rate technical support and customer service